LN Thin Film on Silicon

Single-crystal LN thin film can be integrated on silicon substrate. This structure can be used in integrated optics, nonlinear optics, ferroelectric memory, IR detectors, sensors, MEMS, and SAW devices.

Technical Parameters

LN Thin Film on Silicon

Product Application

The single-crystal lithium niobate thin films, which will be of great interest for developing high-speed, wide-bandwidth, high-density and high-efficiency photonic circuits and electronic devices, are mainly used in the following fields:

  • Integrated optics, such as photonic wires, optical filters,electro-optically tunable micro-ring resonators, and optical detectors. The size of the devices made on our products could be reduced by more than one million times, the integrated level would be  greatly enhanced, the consumption of the power would be lower, the performance would be more stable, meanwhile, the cost would be  greatly reduced.
  • High-density data storage. the capacity of a 3inch piece of lithium tantalate thin film can reach up to 70 Tbit, the equivalent of 100,000 CD’s.
  • Electronic devices and components: surface acoustic wave devices, pyro electric detectors, Terahertz wave generation and propagation etc.
LN Thin Film on Silicon
Size:
3inch
Thickness:
300-700 nm
Orientation:
X cut,Y cut,Z cut

The lithium niobate thin films can be used as basic materials in the following devices and components:

  • Filters
  • Electro-optic modulators
  • Detectors
  • Optical waveguides
  • Sensors
  • Piezoelectric transducers
  • Terahertz wave generation
  • Ultrahigh speed optical switches
  • High-density data storage
  • Phased-array radar
  • Electro-optic prism scanners
  • Fiber-optic gyroscopes
  • High-power microwave devices
  • Bypass capacitors